Computational Lithography
About the book
Discover the groundbreaking insights in Computational Lithography by Xu Ma, published by John Wiley & Sons Inc in 2010. This essential hardback, spanning 256 pages, is the first comprehensive resource dedicated to optimizing resolution enhancement techniques in optical lithography. Dive into a detailed exploration of Resolution Enhancement Techniques (RET) that leverage model-based mathematical optimization methods, making it a vital addition for professionals in integrated circuits design and construction, as well as those involved in microlithography and photolithography mathematics. Whether you are a seasoned expert or a newcomer to the field, this book offers valuable knowledge and practical applications for advancing semiconductor etching processes. Don't miss the opportunity to enhance your understanding of this critical aspect of modern lithography.
| Author | Xu Ma |
|---|---|
| Publisher | John Wiley & Sons Inc |
| Published | 2010 m. |
| Language | English |
| Pages | 256 psl. |
| Format | Hardcover |
| Genre | Matemaatika |
| ISBN | 9780470596975 |