Electromigration Modeling at Circuit Layout Level
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Raamatu andmed
| Autor | Cher Ming Tan |
|---|---|
| Kirjastus | Springer Verlag, Singapore |
| Ilmumisaasta | 2013 m. |
| Keel | Anglų k. |
| Lehekülgi | 103 psl. |
| Köide | Pehmekaaneline |
| Väljaanne | 2013 ed. |
| ISBN | 9789814451208 |
Raamatust
Discover the essential insights into integrated circuit (IC) reliability with Electromigration Modeling at Circuit Layout Level by Springer Verlag. Published in 2013, this informative paperback spans 103 pages and addresses the critical challenges of interconnect failures in modern IC technology. As interconnect dimensions shrink and the number of interconnect levels rises, understanding electromigration becomes crucial for enhancing IC performance and longevity. This book serves as a vital resource for engineers and researchers seeking to improve the reliability of their designs. Get your copy today and stay ahead in the rapidly evolving field of integrated circuits.