Materials, Processes and Reliability for Advanced Interconnects for Micro

Discover the essential insights in Materials, Processes and Reliability for Advanced Interconnects for Micro- and Nanoelectronics — 2009: Volume 1156 by Martin Gall, published by Cambridge University Press. This authoritative volume, consisting of 204 pages, serves as a vital resource for researchers and practitioners in the field of microelectronics and integrated circuits.

Part of the esteemed MRS Symposium Proceeding series, this book delves into the latest advancements in materials and processes crucial for the development of very large scale integration (VLSI) technologies. It offers comprehensive coverage on reliability aspects, making it a must-have reference for anyone involved in micro- and nanoelectronics. Enhance your understanding and stay at the forefront of your field with this indispensable guide.