X-Ray Metrology in Semiconductor Manufacturing
Raamatu andmed
| Autor | D. Keith (Bede Plc, Durham, UK) Bowen |
|---|---|
| Kirjastus | Taylor & Francis Inc |
| Ilmumisaasta | 2006 m. |
| Keel | inglise |
| Lehekülgi | 296 psl. |
| Köide | Kõvakaaneline |
| ISBN | 9780849339288 |
Raamatust
Discover the cutting-edge world of semiconductor manufacturing with X-Ray Metrology in Semiconductor Manufacturing by Taylor & Francis Inc. Published in 2006, this comprehensive hardback edition spans 296 pages and dives deep into the critical aspects of X-ray metrology.
This insightful book emphasizes practical metrology, providing real-world examples from the semiconductor and magnetics industries. Readers will explore a range of techniques, theories, and applications related to X-ray metrology and its vital role in advanced thin films. Key topics include precision, repeatability, absolute accuracy, and spot size—essential elements for any professional in the field.
Whether you're a seasoned engineer or a newcomer to semiconductor manufacturing, this book serves as an invaluable resource, equipping you with the knowledge needed to excel in this evolving industry. Enhance your understanding of metrology and elevate your expertise with this must-have title.