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Advanced Ta-Based Diffusion Barriers for Cu Interconnects

Rene Hubner

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Autorius Rene Hubner
Kalba Anglų k.
Leidimo metai 2009 m.
Puslapių skč. 102 psl.
Viršelis Minkštas viršelis
ISBN 9781604564518

Advanced Ta-Based Diffusion Barriers for Cu Interconnects

Advanced Ta-Based Diffusion Barriers for Cu Interconnects by Rene Hubner.

Published by Nova Science Publishers, (2008), Paperback, 102 pages.

Topics: Electrodiffusion, Integrated circuits, Interconnects (Integrated circuit technology), Diffusion.

Book cover of: Advanced Ta-Based Diffusion Barriers for Cu Interconnects. By: Rene Hubner, René Hübner

Advanced Ta-Based Diffusion Barriers ...

Tavaline hind €49,49
Müügihind €49,49 Tavaline hind €51,49