Pattern Recognition and Artificial Intelligence

Discover the cutting-edge insights in "Pattern Recognition and Artificial Intelligence," authored by Yue Lu and published by Springer Nature Switzerland AG in 2020. This comprehensive volume presents the proceedings of the Second International Conference on Pattern Recognition and Artificial Intelligence (ICPRAI 2020), held in Zhongshan, China, in October 2020. Spanning 741 pages, this first edition features a curated selection of 49 full papers and 14 short papers, all meticulously reviewed for quality and relevance. Dive into the latest research and advancements in the fields of pattern recognition and artificial intelligence, making this book an essential resource for researchers, practitioners, and students alike. Enhance your understanding of these transformative technologies and their applications in various domains.